Electrodeposition of Nickel Sulfide Thin Films Using Triethanolamine as a Complexing Agent
Anuar Kassim*, Zulkarnain Zainal, Saravanan Nagalingam, Dzulkefly Kuang and Nor Hamizi Sharafaddin* Author for corresponding; e-mail address: anuar@fsas.upm.edu.my
Volume: Vol.31 No.2 May 2004
Research Article
DOI:
Received: 11 November 2003, Revised: -, Accepted: 16 Febuary 2004, Published: -
Citation: Kassim A., Zainal Z., Nagalingam S., Kuang D. and Hamizi Sharafaddin N., Electrodeposition of Nickel Sulfide Thin Films Using Triethanolamine as a Complexing Agent, Chiang Mai Journal of Science, 2004; 31(2): 131-137.
Abstract
Nickel sulfide thin films were deposited onto titanium substrates using triethanolamine as a complexing agent. The presence of the complexing agent was found to improve the lifetime of the deposition bath. The deposition conditions for obtaining good quality films such as potentials and concentrations were optimized. The films were characterized using X-ray diffractometry and scanning electron microscopy. The photosensitivity of the films was studied using linear sweep voltammetry in the presence of sodium thiosulphate solution. The bandgap energy was found to be about 1.9 eV with indirect electronic transition.