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Electrodeposition of Nickel Sulfide Thin Films Using Triethanolamine as a Complexing Agent
Paper Type  |
Contributed Paper |
Title |
Electrodeposition of Nickel Sulfide Thin Films Using Triethanolamine as a Complexing Agent |
Author |
Anuar Kassim*, Zulkarnain Zainal, Saravanan Nagalingam, Dzulkefly Kuang and Nor Hamizi Sharafaddin |
Email |
anuar@fsas.upm.edu.my |
|
Abstract: Nickel sulfide thin films were deposited onto titanium substrates using triethanolamine as a complexing agent. The presence of the complexing agent was found to improve the lifetime of the deposition bath. The deposition conditions for obtaining good quality films such as potentials and concentrations were optimized. The films were characterized using X-ray diffractometry and scanning electron microscopy. The photosensitivity of the films was studied using linear sweep voltammetry in the presence of sodium thiosulphate solution. The bandgap energy was found to be about 1.9 eV with indirect electronic transition.
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|
Start & End Page |
131 - 137 |
Received Date |
2003-11-11 |
Revised Date |
|
Accepted Date |
2004-02-16 |
Full Text |
Download |
Keyword |
complexing agent, electrodeposition, nickel sulfide, thin film |
Volume |
Vol.31 No.2 May 2004 |
DOI |
|
Citation |
Kassim A., Zainal Z., Nagalingam S., Kuang D. and Hamizi Sharafaddin N., Electrodeposition of Nickel Sulfide Thin Films Using Triethanolamine as a Complexing Agent, Chiang Mai J. Sci., 2004; 31(2): 131-137. |
SDGs |
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