Chiang Mai Journal of Science

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The reflow behavior of BPSG films deposited by plasma enhanced chemical vapor deposition has been studied in several annealing ambient atmospheres. A new recipe for annealing process has been created and performed to improve the planarization for BPSG film after reflow. This improvement is for 0.35μm technology using steam annealing method at different temperatures. Reflow process was carried out by furnace heating. Reflow was studied over the temperature range of 850°C to 900°C. Cross sectional scanning electron microscopy using FESEM has been employed to study the angles of BPSG films slope after images analysis. The samples have been separated into two groups of samples: staining and without staining with HF. The experiments lead to the conclusion that the staining samples with HF provides clearer images for analysis. By using steam annealing method, the better surface planarization of BPSG film has been achieved.

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