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Home > Patterned Borosilicate Glass by a Simplified Flash Foam Stamping Technique as a Back Passivation Layer for Photovoltaic Structure
 
Patterned Borosilicate Glass by a Simplified Flash Foam Stamping Technique as a Back Passivation Layer for Photovoltaic Structure
Paper Type
Contributed Paper
Title
Patterned Borosilicate Glass by a Simplified Flash Foam Stamping Technique as a Back Passivation Layer for Photovoltaic Structure
Author
Kamonchanok Mekmork, Thipwan Fangsuwannarak*, Supanut Laohawiroj, Peerawoot Rattanawichai and Warakorn Limsiri
Email
thipwan@g.sut.ac.th
Abstract:
The rear surface passivation by a localized dielectric layer for high efficiency silicon solar cells has significant advantages compared with the standard fully covered metal back-contact structure. In this study, partial borosilicate glass (BSG) layer used as rear dielectric passivation of localized back contacts was taken advantage for a local back surface fi eld (LBSF) solar cell, while typically it has been removed after thermal diffusion process fi nished. A simplified flash foam stamping technique has been initially exploited in the single-step process to pattern a localized back BSG passivation. These low cost, simple technique and scalable process have to be considered promising in the high efficiency of commercial solar cells. Acid stamp narrowly removes BSG in order to open the contact area between metal and p-Si substrate. The aperture ratio of the BSG pattern is varied from 5 - 20%. The LBSF solar cell with a localized back BSG passivation showed an increase in open voltage, fi ll factor and power conversion efficiency by 4.88%, 1.43%, and 0.67%, respectively, compared to a sample without LBSF layer. Therefore, this non-complex process using flash foam stamp is an alternative production procedure to have co-operated effectively with solar cell industrial production for power efficiency improvement.
Start & End Page
614 - 623
Received Date
2019-07-26
Accepted Date
2020-02-04
Full Text
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Correspondence:
Author Name
* Thipwan Fangsuwannarak - School of Electrical Engineering, Institute of Engineering, Suranaree University of Technology, Nakhon Ratchasima, 30000, Thailand.
Kamonchanok Mekmork - School of Electrical Engineering, Institute of Engineering, Suranaree University of Technology, Nakhon Ratchasima, 30000, Thailand.
Supanut Laohawiroj - School of Electrical Engineering, Institute of Engineering, Suranaree University of Technology, Nakhon Ratchasima, 30000, Thailand.
Peerawoot Rattanawichai - School of Electrical Engineering, Institute of Engineering, Suranaree University of Technology, Nakhon Ratchasima, 30000, Thailand.
Warakorn Limsiri - School of Electrical Engineering, Institute of Engineering, Suranaree University of Technology, Nakhon Ratchasima, 30000, Thailand.
Keyword:
Keyword
borosilicate glass, passivation layer, local back surface fi eld, flash foam stamping, highefficiency silicon solar cell,
Volume
Vol.47 No.4 (Special Issue II : July 2020)
 




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